Optimization of hydrodynamic pressure levitation polishing process parameters based on uniform design and genetic algorithm
                                                 YIN Linzhi, PIAO Zhongyu, LI Panxing, WEN Donghui
                 (Key Laboratory of E&M, Ministry of Education, Zhejiang University of Technology, Hangzhou 310014, China)

Abstract: Aiming at the problem of pressure uniformity optimization of hydrodynamic pressure suspension polishing flow field, the influence of process parameters on the dynamic pressure in processing area was studied. Computational fluid dynamics (CFD) and uniform design method were used to solve the pressure mean and pressure standard deviation of the processing area under different process parameters. The mathematical model of the fitting of process parameters and pressure mean or pressure standard deviation were established by multiple nonlinear regression method, the process parameters were optimized by genetic algorithm and through numerical model. The pressure distribution and processing effect before and after optimization were compared. The results indicate that there is a nonlinear regression relationship between the selected process parameters, the pressure mean and pressure standard deviation. The optimal process parameters are h=285 μm, ω=1 300 r/min, and φ=0.12. Under this parameter, the flow field pressure in the workpiece area is the largest and the pressure standard difference is the least, which helps to remove the material quickly and evenly.

Key words: hydrodynamic suspension polishing(HSP); numerical simulation; uniform design; multivariate nonlinear regression; process parameter optimization